Molecular mechanism of base excision repair of uracil-containing DNA in yeast cell-free extracts

被引:29
|
作者
Wang, ZG [1 ]
Wu, XH [1 ]
Friedberg, EC [1 ]
机构
[1] UNIV TEXAS,SW MED CTR,DEPT PATHOL,LAB MOL PATHOL,DALLAS,TX 75235
关键词
D O I
10.1074/jbc.272.38.24064
中图分类号
Q5 [生物化学]; Q7 [分子生物学];
学科分类号
071010 ; 081704 ;
摘要
Base excision repair (BER) constitutes a ubiquitous excision repair mechanism, which is responsible for the removal of multiple types of damaged and inappropriate bases in DNA. We have employed a yeast cell-free system to examine the biochemical mechanism of the BER pathway in lower eukaryotes. Using uracil-containing DNA as a model substrate, we demonstrate that yeast BER requires Apn1 protein, an Escherichia coli endonuclease IV homolog. In extracts of an apn1 deletion mutant, the 5'-incision at AP (apurinic/apyrimidinic) sites is not detectable, supporting the notion that yeast contains only one major 5'-AP endonuclease. The processing of the 5'-deoxyribose phosphate moieties was found to be a rate-limiting step. During BER of uracil-containing DNA, repair patch sizes of 1-5 nucleotides were detected, with single nucleotide repair patches predominant.
引用
收藏
页码:24064 / 24071
页数:8
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