Dot-array resist patterning using scanning probe microscopy with a hybrid current-voltage control method

被引：0
作者：
Ishibashi, M [1 ]
Heike, S [1 ]
Hashizume, T [1 ]
机构：
[1] Hitachi Ltd, Adv Res Lab, Hatoyama, Saitama 3500395, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS | 2001年
关键词：
D O I：
10.1109/IMNC.2001.984140
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：162 / 163
页数：2
相关论文
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    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (12B): : 7060 - 7062
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