Influence of electrodeposition techniques and parameters towards the deposition of Pt electrocatalysts for methanol oxidation

被引:11
作者
Abraham, Bincy George [1 ]
Chetty, Raghuram [1 ]
机构
[1] Indian Inst Technol Madras, Dept Chem Engn, Chennai 600036, Tamil Nadu, India
关键词
Pt electrodeposition; Potentiostatic; Galvanostatic; Cyclic voltammetry; Pulse deposition; Methanol oxidation; FORMIC-ACID; PULSED ELECTRODEPOSITION; PLATINUM NANOPARTICLES; PALLADIUM DENDRITES; CARBON SUPPORT; CATALYSTS; EFFICIENT; TITANIUM; ANODE; NANOSTRUCTURES;
D O I
10.1007/s10800-020-01510-4
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Deposition of platinum catalysts on a titanium substrate (Pt/Ti) was performed using various electrodeposition techniques, and an optimum deposition condition attributing to enhanced activity towards methanol oxidation reaction (MOR) was identified. Physical characterization confirmed that the variation of deposition parameters resulted in Pt nanostructures with various morphologies. The final morphology of the Pt catalyst was strongly influenced by the average potential applied or observed during the deposition. Dynamic applied waveform electrodeposition techniques, namely cyclic voltammetry deposition and pulse current deposition, were found to offer efficient deposition and homogeneous distribution of Pt on Ti compared to constant applied waveform deposition techniques such as potentiostatic and galvanostatic deposition, which could be attributed to the improved homogeneity of metal ion concentration during deposition. Among the various deposition techniques and parameters studied, results indicate that Pt catalysts deposited by pulse electrodeposition with a low-duty cycle was found to be the optimum to achieve high catalytic activity towards MOR. The results of this study not only reflect the fundamental understanding of Pt morphology at different deposition modes but also highlight the importance of performing the deposition with an optimal deposition technique and parameters to have a better and more efficient metal deposition from its precursor. [GRAPHICS] .
引用
收藏
页码:503 / 520
页数:18
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