tin dioxide;
molecular beam epitaxy;
TIN OXIDE-FILMS;
DEPOSITION;
SAPPHIRE;
D O I:
10.1016/j.snb.2006.04.006
中图分类号:
O65 [分析化学];
学科分类号:
070302 ;
081704 ;
摘要:
A comparative study of the gas sensing properties between mono- and poly-crystalline tin dioxide thin films has been carried out. SnO2 films of thickness range 30-100nm were deposited on r-axis sapphire substrate in temperature range 260-550 degrees C using the molecular beam epitaxy (MBE) technique. The crystalline structure of the resulting films was examined by using in situ high energy electron diffraction (RHEED), X-ray diffraction (XRD) and atomic force microscopy (AFM). The electrical properties of the films were characterized by using a Hall effect measurement system. Sensitivity towards different gases was tested and a comparison between mono- and poly-crystalline films is presented. Monocrystalline films were found to exhibit greater potential for continuous gas detection. (c) 2006 Elsevier B.V. All rights reserved.
机构:
Kothamangalam Coll, Mar Athanasius Coll Autonomous, Res Ctr Phys, PO Kothamangalam, Kothamangalam 686666, Kerala, IndiaKothamangalam Coll, Mar Athanasius Coll Autonomous, Res Ctr Phys, PO Kothamangalam, Kothamangalam 686666, Kerala, India
Deepa, S.
George, Andrew Simon
论文数: 0引用数: 0
h-index: 0
机构:
Kothamangalam Coll, Mar Athanasius Coll Autonomous, Res Ctr Phys, PO Kothamangalam, Kothamangalam 686666, Kerala, IndiaKothamangalam Coll, Mar Athanasius Coll Autonomous, Res Ctr Phys, PO Kothamangalam, Kothamangalam 686666, Kerala, India