Scanning gate measurements in the quantum Hall regime at 300 mK

被引:3
作者
Kicin, S
Pioda, A
Ihn, T [1 ]
Ensslin, K
Driscoll, DD
Gossard, AC
机构
[1] ETH, Solid State Phys Lab, CH-8093 Zurich, Switzerland
[2] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
关键词
quantum Hall effect; edge states; scanning probe techniques; scanning gate technique;
D O I
10.1016/j.physe.2003.11.103
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Scanning gate measurements have been performed on a shallow two-dimensional electron gas in a Ga[Al]As heterostructure in the quantum Hall regime at 300 mK. This technique uses the local electrostatic potential induced by the conducting tip of a scanning force microscope for influencing the resistance of mesoscopic structures. Applied at high magnetic fields and low temperatures on a Hall bar sample, it is a further development of previous backscattering experiments with spatially immobile gates. This technique gives insight into the nature of the states in the interior and at the edges of a Hall bar with a width of 4 mum. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:708 / 711
页数:4
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