Electrical properties of lead zirconate titanate thin films with a ZrO2 buffer layer on an electroless Ni-coated Cu foil

被引:6
作者
Kim, Taeyun
Kingon, Angus I.
Maria, Jon-Paul
Croswell, Robert T.
机构
[1] N Carolina State Univ, Dept Mat Sci & Engn, Raleigh, NC 27695 USA
[2] Motorola Labs, Phys Realizat Res Ctr Excellence, Schaumburg, IL 60196 USA
关键词
D O I
10.1111/j.1551-2916.2006.01240.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effect of zirconia (ZrO2) buffer layers on the phase development and electrical properties of lead zirconate titanate (PZT, 52/48) capacitors on an electroless Ni (P)-coated Cu foil was investigated. It was demonstrated that the buffer layer can be used to engineer the final properties. The incorporation of the ZrO2 buffer layers retained acceptable capacitance densities (> 350 nF/cm(2) for 50 nm thick ZrO2), while significantly reducing leakage currents and improving reliability (< 10(-7) A/cm(2) after 1 h at 25 VDC for 100 nm thick ZrO2), compared with PZT thin films directly on electroless Ni (P). The results are particularly important for embedded capacitor applications.
引用
收藏
页码:3426 / 3430
页数:5
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