Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy

被引：11

作者：

Imazono, T ^{[1
]}

Hirayama, Y ^{[1
]}

Ichikura, S ^{[1
]}

Kitakami, O ^{[1
]}

Yanagihara, M ^{[1
]}

Watanabe, M ^{[1
]}

机构：

[1] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Aoba Ku, Sendai, Miyagi 9808577, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2004年 / 43卷 / 7A期

关键词：

Fe/Si multilayer; magnetic exchange coupling; soft X-ray fluorescence; interface; interdiffusion;

D O I：

10.1143/JJAP.43.4327

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We measured the Si L-2,L-3 fluorescence spectrum of an antiferromagnetically coupled Fe (3.0 nm)/Si (1.3 nm) multilayer using undulator synchrotron radiation. We estimated the chemical composition and thickness of Fe silicide layers formed by interdiffusion by curve fitting analysis using the fluorescence spectra of amorphous Fe silicides. We clarified that the amorphous Si layer of 1.3 nm thickness changed in its middle region into amorphous FeSi2 of 0.7 nm thickness, which plays an important role in the strong anti ferromagnetic exchange coupling in the Fe/Si multilayer. It was also confirmed that soft-X-ray fluorescence spectroscopy has a high potential for analyzing buried interfaces nondestructively.

引用

页码：4327 / 4333

页数：7

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