Effect of vaporization and melt ejection on laser machining of silica glass micro-optical components

被引：53

作者：

Markillie, GAJ ^{[1
]}

Baker, HJ ^{[1
]}

Villarreal, FJ ^{[1
]}

Hall, DR ^{[1
]}

机构：

[1] Heriot Watt Univ, Dept Phys, Edinburgh EH14 4AS, Midlothian, Scotland

来源：

APPLIED OPTICS | 2002年 / 41卷 / 27期

关键词：

D O I：

10.1364/AO.41.005660

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A new regime for silica glass machining for micro-optical fabrication applications, which uses pulsed CO2 laser radiation in the 2.5-100-mus pulse width region that has been generated by an acousto-optic modulator, is investigated. A filamentary melt ejection process that generates fibers and significant melt displacement limits machining quality below 30-mus pulse width. Ablation and melt ejection thresholds are quantified relative to pulse width, and the region from 30 to 50 mus is identified for low-threshold, smooth machining without melt displacement and ejection effects. (C) 2002 Optical Society of America.

引用

页码：5660 / 5667

页数：8

共 20 条

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