Excimer laser irradiation of SrRuO3 epitaxial thin films

被引：2

作者：

Benítez, F ^{[1
]}

Roldán, J ^{[1
]}

Trtík, V ^{[1
]}

Guerrero, C ^{[1
]}

Ferrater, C ^{[1
]}

Sánchez, F ^{[1
]}

Varela, M ^{[1
]}

机构：

[1] Univ Barcelona, Dept Fis Aplicada & Opt, E-08028 Barcelona, Spain

来源：

APPLIED SURFACE SCIENCE | 2000年 / 154卷

关键词：

laser irradiation; SrRuO3; laser patterning; thin films;

D O I：

10.1016/S0169-4332(99)00395-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Single and multishot excimer laser ablation of SrRuO3 (SRO) epitaxial thin films has been studied, aiming at selective removal of SRO electrodes in device applications. High quality SRO epitaxial thin films were grown by pulsed laser deposition on LaALO(3) (001) substrates; subsequent irradiation was performed by an excimer laser at 248 nm wavelength. Inspection of the ablated surfaces by scanning electron microscopy shows the existence of two well-defined regimes above damage threshold depending on the laser fluence, namely exfoliational and hydrodynamical, which closely correspond to the different mechanisms responsible for material emission. The role of spot size and film thickness with regard to improved edge definition and damage-free substrates has been studied. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：622 / 626

页数：5

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