Using notch-filter masks for high-contrast imaging of extrasolar planets

被引：10

作者：

Debes, JH

Ge, J

Kuchner, MJ

Rogosky, M

机构：

[1] Penn State Univ, Dept Astron & Astrophys, University Pk, PA 16802 USA

[2] Princeton Univ, Dept Astrophys Sci, Princeton, NJ 08544 USA

[3] Penn State Univ, Nanofabricat Facil, University Pk, PA 16802 USA

来源：

ASTROPHYSICAL JOURNAL | 2004年 / 608卷 / 02期

关键词：

circumstellar matter; instrumentation : adaptive optics methods : laboratory; planetary systems;

D O I：

10.1086/420734

中图分类号：

P1 [天文学];

学科分类号：

0704 ;

摘要：

We present the first laboratory experiments using a notch-filter mask, a coronagraphic image mask that can produce infinite dynamic range in an ideal Lyot coronagraph, according to scalar diffraction theory. We fabricated the first notch-filter mask prototype with 0.25 mum precision using an electron-beam lithography machine. Our initial optical tests show that the prototype masks generate contrast levels of 10(-5) at 3lambda/D and 10(-6) at similar to8lambda/D, with a throughput of 27%. We speculate on the "as-is" perfomance of such a mask in the Hubble Space Telescope.

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收藏

页码：1095 / 1099

页数：5

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