The low-field permanent magnet electrostatic plasma lens

被引:2
作者
Goncharov, A
Gorshkov, V
Maslov, V
Zadorozhny, V
Brown, I
机构
[1] NASU, Inst Phys, UA-03039 Kiev, Ukraine
[2] NSC Kharkov Inst Phys & Technol, UA-61108 Kharkov, Ukraine
[3] NASU, Inst Cybernet, UA-03680 Kiev, Ukraine
[4] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
关键词
D O I
10.1063/1.1699450
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We describe the status of ongoing research and development of the electrostatic plasma lens as used for the manipulation of high current broad beams of heavy ions of moderate energy. In some collaborative work at Lawrence Berkeley National Laboratory the lens was used to good effect for carrying out high dose ion implantation processing. In the process of this work a very narrow range of low magnetic field was found for which the ion-optical characteristics of the lens improved markedly. Subsequent theoretical analysis and computer modeling has led to an understanding of this phenomenon. These serendipitous results open up some attractive possibilities for the development of a new compact and low cost plasma lens based on permanent magnets rather than on current-driven field coils surrounding the lens volume. The development of this kind of lens, including both very low noise and minimal spherical aberration effects, may lead to a tool suitable for use in the injection beam lines of high current heavy ion linear accelerators. Here we briefly review the lens fundamentals, some characteristics of focusing heavy ion beams at low magnetic fields, and summarize recent theoretical and experimental developments, with emphasis on the relevance and suitability of the lens for accelerator injection application. (C) 2004 American Institute of Physics.
引用
收藏
页码:1662 / 1664
页数:3
相关论文
共 13 条
[11]  
MOROZOV AI, 1965, DOKL AKAD NAUK SSSR+, V163, P1363
[12]  
PARSA Z, 2002, CYBERMETICS SYSTEMS, V5, P122
[13]  
PROTSENKO I, 2002, 20 ISDEIV P TOURS FR, P287