Optimization of the material removal in fluid jet polishing

被引:31
作者
Fang, Hui [1 ]
Guo, Peiji [1 ]
Yu, Jingchi [1 ]
机构
[1] Soochow Univ, Prov Key Lab Modern Opt Technol Jiangsu, Suzhou 215006, Peoples R China
关键词
fluid jet polishing; removal function; oblique incidence;
D O I
10.1117/1.2203650
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Removal-function models play an important role in computer-controlled optical surfacing. We investigate removal-function models of fluid jet polishing experimentally to obtain an optimum one. We adjust the nozzle and let the slurry jet guided by it impact the workpiece with both normal and oblique incidence angle from different positions. The experimental results indicate that when the slurry jet impacts workpiece obliquely from four positions, the profile of material removal approximates to an ideal one with maximum removal at the center, decreasing to zero at the edges. This new removal-function model avoids the disadvantages of the ring-shaped one, and satisfies the requirement of optical manufacturing to obtain a high degree of precision. (C) 2006 Society of Photo-Optical Instrumentation Engineers.
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页数:6
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