Basic self-formation processes in the technologies of the integrated circuits

被引：5

作者：

Navickas, R

Kirvaitis, R

机构：

[1] Vilnius Gediminas Tech Univ, Radioengn Dept, Elect Fac, LT-2006 Vilnius, Lithuania

[2] Vilnius Gediminas Tech Univ, LT-2040 Vilnius, Lithuania

来源：

SELF FORMATION THEORY AND APPLICATIONS | 2004年 / 97-98卷

关键词：

self-formation processes; technologies of integrated circuits;

D O I：

10.4028/www.scientific.net/SSP.97-98.229

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The analysis for basic processes of self-formation microstructure in technologies of manufacturing semiconductor devices and integrated circuits (IC) have been made and the requirements have been formulated. The results of the implementation of self-formation processes for creating new technologies of manufacturing semiconductor devices and IC have been presented.

引用

页码：229 / 234

页数：6