Electrical properties of Al-doped ZnO films fabricated by a hot-cathode plasma sputtering method

被引：1
作者：
Kono, Akihiko [1 ]
Shoji, Fumiya [1 ]
机构：
[1] Kyushu Kyoritsu Univ, Grad Sch Engn, Fukuoka 8078585, Japan
来源：
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS | 2009年 / 162卷 / 03期
关键词：
Zinc oxide; Sputtering; Thin films; Plasma processing; Oxides; Electrical measurements; OPTICAL-PROPERTIES; MAGNETRON; BIAS;
D O I：
10.1016/j.mseb.2009.04.002
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A hot-cathode plasma Sputtering technique Was used to fabricate highly transparent and conducting aluminum-doped zinc oxide (AZO) films oil glass substrates from disk shaped AZO (Al2O3: 5 wt.% and 2 wt.%) targets. Using a target voltage V-T = -200 V and plasma excitation pressure P-Ar = 1.5 x 10(-3) Tort, the lowest resistivity of 4.0 x 10(-4) Omega cm was obtained at 400 nm with a carrier density of 8.7 x 10(20) cm(-3) and a Hall mobility of 17 cm(2)/V s. The analyzed structural properties of these films revealed that this lower resistivity was due to a decrease in the lattice spacing d((0) (0) (2)) of the (0 0 2) plane parallel to the substrate surface. This decrease in lattice spacing was presumably caused by oxygen vacancies acting as an effective source of carrier electrons. (C) 2009 Elsevier B.V. All rights reserved.
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页码：167 / 172
页数：6
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  • [11] Stability in a high humidity environment of TCO thin films deposited at low temperatures
    Minami, Tadatsugu
    Kuboi, Takeshi
    Miyata, Toshihiro
    Ohtani, Yuusuke
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2008, 205 (02): : 255 - 260
  • [12] The physical properties of Al-doped zinc oxide films prepared by RF magnetron sputtering
    Park, KC
    Ma, DY
    Kim, KH
    [J]. THIN SOLID FILMS, 1997, 305 (1-2) : 201 - 209
  • [13] SURFACE ANALYSIS WITH LOW-ENERGY ION SCATTERING
    TAGLAUER, E
    HEILAND, W
    [J]. APPLIED PHYSICS, 1976, 9 (04): : 261 - 275
  • [14] On the ion and neutral atom bombardment of the growth surface in magnetron plasma sputter deposition
    Van Hattum, E. D.
    Palmero, A.
    Arnoldbik, W. M.
    Rudolph, H.
    Habraken, F. H. P. M.
    [J]. APPLIED PHYSICS LETTERS, 2007, 91 (17)
  • [15] Effects of substrate bias on nanocrystal-(Ti,Al)Nx/amorphous-SiNy composite films
    Yau, BS
    Huang, JL
    Kan, MC
    [J]. JOURNAL OF MATERIALS RESEARCH, 2003, 18 (08) : 1985 - 1990
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