Magnetic properties of Co-N films deposited by ECR nitrogen/argon plasma with DC negative-biased Co target

被引：6
作者：
Li, H. [1 ]
Zhang, Y. C. [1 ]
Yang, K. [1 ]
Liu, H. X. [1 ]
Zhu, X. D. [1 ]
Zhou, H. Y. [1 ]
机构：
[1] Univ Sci & Technol China, Dept Modern Phys, Hefei 230026, Anhui, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2017年 / 406卷
基金：
中国国家自然科学基金;
关键词：
Co-N films; ECR plasma; Magnetic properties; THIN-FILMS; CRYSTAL-STRUCTURE; NITRIDES; COBALT; PHASE;
D O I：
10.1016/j.apsusc.2017.02.122
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
By introducing DC negative-biased Co target in the Electron Cyclotron Resonance (ECR) nitrogen/argon plasma, the Co-N films containing Co4N phase were synthesized on Si(100) substrate. Effects of processing parameters on magnetic properties of the films are investigated. It is found that magnetic properties of Co-N films vary with Na/Ar flow ratio, substrate temperature, and target biasing voltage. The saturation magnetization M-s, decreased by increasing the N-2/Ar gas flow ratio or decreasing target biasing voltage, while the coercive field H-c increased, which is ascribed to the variation of relative concentration for Nor Co active species in plasma vapor. The magnetic properties present complex dependency with growth temperature, which is related to the atom mobility on the substrate affected by the growth temperature. This study exhibits a potential of ECR plasma chemical vapor deposition to synthesize the interstitial compounds and tune magnetic properties of films. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码：110 / 114
页数：5
相关论文
共 50 条
[41]   Effects of nitrogen annealing on surface structure, silicide formation and magnetic properties of ultrathin films of Co on Si(100) [J].
Rajan, Ganesh K. ;
Ramaswamy, Shivaraman ;
Gopalakrishnan, C. ;
Thiruvadigal, D. John .
BULLETIN OF MATERIALS SCIENCE, 2012, 35 (01) :13-18
[42]   Impact of Argon working pressure on the magnetic properties of sputtered Co60Fe20B20 thin films [J].
Gupta, Nanhe Kumar ;
Barwal, Vineet ;
Hait, Soumyarup ;
Pandey, Lalit ;
Mishra, Vireshwar ;
Saravanan, L. ;
Kumar, Amar ;
Sharma, Nikita ;
Kumar, Nakul ;
Husain, Sajid ;
Chaudhary, Sujeet .
THIN SOLID FILMS, 2022, 756
[43]   EFFECT OF ANNEALING OF Co-DOPED ZnO THIN FILMS ON STRUCTURAL AND MAGNETIC PROPERTIES DEPOSITED BY SOL-GEL/SPIN-COATING TECHNIQUE [J].
Mohammedi, Abdelkader ;
Ibrir, Miloud ;
Meglali, Omar ;
Pena-Garcia, R. .
SURFACE REVIEW AND LETTERS, 2022, 29 (07)
[44]   Magnetic Anisotropy and Magneto-Transport Properties of Co–Ni–N Granular Alloys Thin Films [J].
S. I. Tanase ;
D. Pinzaru (Tanase) ;
V. Georgescu .
Journal of Superconductivity and Novel Magnetism, 2011, 24 :2313-2319
[45]   Study of Structural and Magnetic Properties of Pd-Doped Co4N Thin Films [J].
Akshaya, A. ;
Kalal, Shailesh ;
Saravanan, K. ;
Ojha, Sunil ;
Stahn, Jochen ;
Gupta, Mukul .
JOURNAL OF SUPERCONDUCTIVITY AND NOVEL MAGNETISM, 2025, 38 (01)
[46]   Study of structural microstructural. and magnetic properties of very thin Co50Pt50 films deposited by PLD [J].
Agostinelli, E. ;
Laureti, S. ;
Varvaro, G. ;
Generosi, A. ;
Paci, B. ;
Rossi-Albertini, V. ;
Scavia, G. ;
Testa, A. M. .
MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, 2007, 27 (5-8) :1466-1469
[47]   Structural, optical and magnetic properties of Fe, Co and Co-Fe doped SnO2 thin films deposited by a thermionic vacuum arc deposition system [J].
Pat, Suat ;
Oztetik, Betul ;
Korkmaz, Sadan .
SURFACES AND INTERFACES, 2024, 45
[48]   Microstructural, mechanical and wear properties of Cr-Al-B-N coatings deposited by DC reactive magnetron co-sputtering [J].
Chang, Chi-Lung ;
Huang, Chi-Song ;
Jao, Jui-Yun .
SURFACE & COATINGS TECHNOLOGY, 2011, 205 (8-9) :2730-2737
[49]   Dependence of soft-magnetic properties on film thickness and high frequency characteristics for Fe-Co-Cr-N alloy films [J].
Wang, W. ;
Chen, Y. ;
Yue, G. H. ;
Mi, W. B. ;
Bai, H. L. ;
Sumiyama, K. ;
Peng, D. L. .
JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 476 (1-2) :599-602
[50]   Microstructure and mechanical properties of hard Ti-Si-C-N films deposited by dc magnetron sputtering of multicomponent Ti/C/Si target [J].
Onoprienko, A. A. ;
Ivashchenko, V. V. ;
Dub, S. N. ;
Khyzhun, O. Yu. ;
Timofeeva, I. I. .
SURFACE & COATINGS TECHNOLOGY, 2011, 205 (21-22) :5068-5072
12345