Formation and characterization of thin films of H(CH2)xPO(OH)2 on polycrystalline zinc substrates

被引：24
作者：
Sinapi, F
Forget, L
Delhalle, J
Mekhalif, Z
机构：
[1] Fac Univ Notre Dame Paix, Lab Interdisciplinaire Spect Electron, B-5000 Namur, Belgium
[2] Usinor Grp, Res & Dev Cockerill Sambre, B-4000 Liege, Belgium
来源：
SURFACE AND INTERFACE ANALYSIS | 2002年 / 34卷 / 01期
关键词：
polycrystalline zinc; n-pentanephosphonic acid; n-tetradecanephosphonic acid; XPS; contact angle; scanning Kelvin probe; polarization curves;
D O I：
10.1002/sia.1272
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Monolayers of n-pentanephosphonic or n-tetradecanephosponic acids are obtained by immersion of mechanically polished zinc substrates in solutions of either absolute ethanol or a mixture of water/ethanol (25/75%). X-ray photoelectron spectroscopy, contact angle and scanning Kelvin probe measurements indicate that both compounds lead to good-quality monolayers and the longer alkyl chain n-tetradecanephosponic acid molecules form the more densely packed films. However, the best films (n-tetradecanephosponic acids) do not show any resistance to electrochemical assays (polarization curves in NaOH and NaCl). Copyright (C) 2002 John Wiley Sons, Ltd.
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收藏
页码：148 / 154
页数：7
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