Low-voltage blue light emission from n-ZnO/p-GaN heterojunction formed by RF magnetron sputtering method

被引:43
作者
Shen, Yanwei [1 ]
Chen, Xiang [1 ]
Yan, Xiaoqin [1 ]
Yi, Fang [1 ]
Bai, Zhiming [1 ]
Zheng, Xin [1 ]
Lin, Pei [1 ]
Zhang, Yue [1 ,2 ]
机构
[1] Univ Sci & Technol Beijing, State Key Lab Adv Met & Mat, Sch Mat Sci & Engn, Beijing 100083, Peoples R China
[2] Univ Sci & Technol Beijing, Key Lab New Energy Mat & Technol, Beijing 100083, Peoples R China
关键词
ZnO film; ZnO/GaN heterojunction; RF magnetron sputtering; Electroluminescence; ELECTRICAL-PROPERTIES; EMITTING-DIODES; FILMS; ELECTROLUMINESCENCE; FABRICATION;
D O I
10.1016/j.cap.2013.12.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High quality n-ZnO/p-GaN heterojunction was fabricated by growing highly crystalline ZnO epitaxial films on commercial p-type GaN substrates via radio frequency (RF) magnetron sputtering. Low-voltage blue light emitting diode with a turn-on voltage of similar to 2.5 V from the n-ZnO/p-GaN heterojunction was demonstrated. The diode gives a bright blue light emission located at similar to 460 nm and a low threshold voltage of 2.7 V for emission. Based on the results of the photoluminescence (PL) and electroluminescence (EL) spectra, the origins of the EL emissions were studied in the light of energy band diagrams of ZnO-GaN heterojunction, and may attribute to the radiative recombination of the holes in p-GaN and the electrons injected from n-ZnO, which almost happened on the side of p-GaN layer. These results may have important implications for developing short wavelength optoelectronic devices. (C) 2013 Elsevier B. V. All rights reserved.
引用
收藏
页码:345 / 348
页数:4
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