X-RAY TOPOGRAPHIC OBSERVATIONS OF BONDED SILICON-ON-INSULATOR WAFERS USING SYNCHROTRON RADIATION

被引：0
|
作者：
Fukuda, K. [1 ]
Yoshida, T. [1 ]
Shimura, T. [1 ]
Umeno, M. [1 ]
Iida, S. [2 ]
机构：
[1] Osaka Univ, Mat & Life Sci, Grad Sch Engn, Suita, Osaka 5650871, Japan
[2] Toyama Univ, Fac Sci, Dept Phys, Toyama, Japan
来源：
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 2002年 / 58卷
关键词：
SILICON-ON-INSULATOR; SYNCHROTRON; X-RAY; TOPOGRAPHY; BONDED; WAFER;
D O I：
10.1107/S0108767302091870
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：C171 / C171
页数：1
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