Optical system for a multiple-beam scanning electron microscope

被引:9
|
作者
Enyama, Momoyo [1 ]
Sakakibara, Makoto [1 ]
Tanimoto, Sayaka [1 ]
Ohta, Hiroya [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2014年 / 32卷 / 05期
关键词
COLUMN;
D O I
10.1116/1.4891961
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel optical system for a multiple-beam scanning electron microscope (SEM) is proposed. In the case of multiple-beam SEM, multiple secondary-electron beams passing through the column are inherently blurred because of the large energy spread and broad angular distribution of secondary electrons. To avoid cross-talk between the multiple secondary-electron beams, the optical system is designed such that it is divided into two independent parts: one for primary-beam illumination and one for secondary-electron detection. As the key components for the secondary-electron detection, a scan-cancelling deflector, and accelerating electric field were applied. To demonstrate the proposed optical system, a prototype column with four beams was developed. This column enables four SEM images to be separately but simultaneously acquired with more than 99% of the generated secondary electrons. This result demonstrates that high-speed imaging with the proposed multiple-beam SEM is possible in the near future. (C) 2014 American Vacuum Society.
引用
收藏
页数:6
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