Effect of Laser Fluence on the Structural and Optical Properties of Tantalum Oxide Films Ablated by Pulsed Laser

The influence of laser fluence on the properties of thin films of tantalum oxide is studied in this paper, varying the laser fluence from 5.7 to 8.3 J/cm(2). Thin films of tantalum oxide were deposited on glass substrates using pulsed-laser ablation technique. X-ray diffraction studies confirm the amorphous/nanocrystalline nature of all the films irrespective of the laser fluence. The Tauc plot analysis suggests that tantalum oxide is an indirect band gap material, whose band gap decreases with increase in laser fluence. The refractive index of the films is found to decrease with increase in laser fluence but the extinction coefficient of the films increases with increase in laser fluence. Fourier transform infrared studies suggest the use of tantalum oxide thin films as oxygen sensors. Micro-Raman analysis reveals the sensitiveness of Ta-O-Ta and Ta-O vibration modes to laser fluence. Among all the films, the film deposited at a laser fluence of 7 J/cm(2) is found to be superior in quality.