Improvement of Compact Electron-Beam-Excited Plasma Source for Increased Producible Plasma Density

被引：9

作者：

Ichiki, Ryuta ^{[1
]}

Hara, Tamio ^{[1
]}

机构：

[1] Toyota Technol Inst, Tenpaku Ku, Nagoya, Aichi 4688511, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2009年 / 48卷 / 07期

关键词：

MECHANICAL-PROPERTIES; OXYGEN PLASMA; LOW-PRESSURE; NITROGEN; LAYER; FILMS; DEPOSITION; CVD; DISSOCIATION; SURFACE;

D O I：

10.1143/JJAP.48.076001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Multiple modifications of graphite electrodes of a compact electron-beam-excited plasma (EBEP) source to enhance the cooling efficiency of the electrodes resulted in an increase in the maximum value of producible EBEP density. In addition, experiments on surface nitriding of steel samples in nitrogen EBEP demonstrated that the improved compact EBEP source with modified electrodes outperforms one with conventional electrodes, thereby demonstrating the significant advantage of using the improved source for a wide range of industrial and scientific applications. (C) 2009 The Japan Society of Applied Physics

引用

页数：6

共 50 条

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