Structure and formation mechanisms of AlGaAs V-groove vertical quantum wells grown by low pressure organometallic chemical vapor deposition

被引:34
作者
Biasiol, G
Reinhardt, F
Gustafsson, A
Martinet, E
Kapon, E
机构
[1] Inst. de Micro et Optoelectronique, Département de Physique, Ecl. Polytech. Federale de Lausanne
关键词
D O I
10.1063/1.117686
中图分类号
O59 [应用物理学];
学科分类号
摘要
The structure of AlGaAs vertical quantum well (VQW) structures grown by low-pressure organometallic chemical vapor deposition on V-grooved GaAs substrates was analyzed as a function of growth temperature and Al mole fraction using transmission electron microscopy and atomic force microscopy (AFM). The low-pressure growth yields several, extremely narrow (a few nm wide) branches of Ga-enriched VQWs at the bottom of the grooves, The variation in Al content across the VQW was evaluated by measuring the AlCaAs oxide thickness on a cleaved edge of the structure using AFM in air. The transmission electron microscopy analysis demonstrates that the different VQW branches originate from distinct nanofacets that self-order at the bottom of the V-groove, probably due to facet-induced segregation of group III species. (C) 1996 American Institute of Physics.
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页码:2710 / 2712
页数:3
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