Enhanced charge separation and oxidation kinetics of BiVO4 photoanode by double layer structure

被引:25
作者
Yang, Lin [1 ]
Xiong, Yuli [1 ]
Dong, Hongmei [2 ]
Peng, Huarong [2 ]
Zhang, Yunhuai [2 ]
Xiao, Peng [1 ,2 ]
机构
[1] Chongqing Univ, Coll Phys, Chongqing 400030, Peoples R China
[2] Chongqing Univ, Coll Chem & Chem Engn, Chongqing 400030, Peoples R China
关键词
BiVO4; Double layer structure; Water oxidation; Charge separation; Oxidation kinetics; BISMUTH VANADATE PHOTOANODES; PHOTOCATALYTIC ACTIVITY; WATER; TIO2; TRANSPORT; HETEROJUNCTION; PERFORMANCE; ABSORPTION; REDUCTION; CATALYSTS;
D O I
10.1016/j.jpowsour.2017.01.050
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Monoclinic bismuth vanadate (BiVO4) is a promising semiconductor for photoelectrochemical water splitting. Here, we developed a facile fabrication of BiVO4 double layer photoanode on the fluorine-doped tin oxide substrate by electrodeposition. The BiVO4 double layer photoanode is composed by a dense BiVO4 film as the inner layer and a nanoporous BiVO4 film as the outer layer. Compared to the BiVO4 single layer photoanode, the optimized BiVO4 double layer photoanode produced a much higher photocurrent of 1.15 mA/cm(2) at 0.6 V vS. Ag/AgCl under AM 1.5G (100 mW/cm(2)) illumination. The results of the photoelectric conversion kinetics for different samples revealed that the charge separation and oxidation kinetics efficiencies for the BiVO4 double layer are 47.2% and 51.6% at 0.6 V vs. Ag/AgCl, while the values for BiVO4 single layer are 32.3% and 35.8%, respectively. The improved photoelectrochemical performance for BiVO4 double layer is mainly ascribed to the decrease of defect state at the interface after inserting a dense BiVO4 as an inner layer to prevent the recombination of photogenerated electron-hole pairs. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:67 / 75
页数:9
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