ToF-SIMS analysis of atmospherically relevant sulphuric acid hydrate films and reactions thereof

被引：4

作者：

Fletcher, JS ^{[1
]}

Vickerman, JC ^{[1
]}

机构：

[1] UMIST, Surface Anal Res Ctr, Manchester M60 1QD, Lancs, England

来源：

APPLIED SURFACE SCIENCE | 2004年 / 231卷

关键词：

atmospheric; sulphuric acid; ammonia;

D O I：

10.1016/j.apsusc.2004.03.049

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Sulphuric acid hydrate films have been formed under UHV conditions by the co-deposition of SO3 and H2O on a cooled substrate and analysed using secondary ion mass spectrometry (SIMS). The deposition conditions follow procedures reported in recent infra-red spectroscopic studies. Spectra contain characteristic fragments, the change in intensities of which can be related to changes in temperature and relative abundance of H2O during deposition of the film under UHV conditions. The reaction of such films with varying amounts of ammonia has been monitored and changes in relative peak intensity have been explained using ammonium sulphate and bisulphate reference spectra. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：524 / 527

页数：4

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