Resistive switching characteristics of indium-tin-oxide thin film devices

被引:3
|
作者
Khiat, Ali [1 ]
Salaoru, Iulia [1 ]
Prodromakis, Themistoklis [1 ]
机构
[1] Univ Southampton, Sch Elect & Comp Sci, Nano Res Grp, Southampton SO17 1BJ, Hants, England
基金
英国工程与自然科学研究理事会;
关键词
ITO active layer; memristor; resistive switching; ReRAM devices; ELECTRICAL-PROPERTIES; MEMRISTIVE DEVICES; IN2O3; FILMS; OXIDATION;
D O I
10.1002/pssa.201330646
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We demonstrate that indium tin oxide (ITO), when used as an active core material in metal-insulator-metal type devices, facilitates resistive switching. We fabricated devices both on silicon as well as quartz wafers, to demonstrate transparent devices. Furthermore, we investigated the influence of active core thickness on the devices' characteristics, showing that their switching threshold scales with the ITO thickness. Unipolar switching was observed for devices comprising thick ITO films while bipolar switching occurred for both thin and thick ITO films at the absence of high voltage forming steps. Our study demonstrates that ITO holds good potential for resistive memory applications.
引用
收藏
页码:1194 / 1199
页数:6
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