Resistive switching characteristics of indium-tin-oxide thin film devices

被引:3
|
作者
Khiat, Ali [1 ]
Salaoru, Iulia [1 ]
Prodromakis, Themistoklis [1 ]
机构
[1] Univ Southampton, Sch Elect & Comp Sci, Nano Res Grp, Southampton SO17 1BJ, Hants, England
基金
英国工程与自然科学研究理事会;
关键词
ITO active layer; memristor; resistive switching; ReRAM devices; ELECTRICAL-PROPERTIES; MEMRISTIVE DEVICES; IN2O3; FILMS; OXIDATION;
D O I
10.1002/pssa.201330646
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We demonstrate that indium tin oxide (ITO), when used as an active core material in metal-insulator-metal type devices, facilitates resistive switching. We fabricated devices both on silicon as well as quartz wafers, to demonstrate transparent devices. Furthermore, we investigated the influence of active core thickness on the devices' characteristics, showing that their switching threshold scales with the ITO thickness. Unipolar switching was observed for devices comprising thick ITO films while bipolar switching occurred for both thin and thick ITO films at the absence of high voltage forming steps. Our study demonstrates that ITO holds good potential for resistive memory applications.
引用
收藏
页码:1194 / 1199
页数:6
相关论文
共 50 条
  • [1] Effects of plasma treatment time on surface characteristics of indium-tin-oxide film for resistive switching storage applications
    Chen, Po-Hsun
    Chang, Ting-Chang
    Chang, Kuan-Chang
    Tsai, Tsung-Ming
    Pan, Chih-Hung
    Shih, Chih-Cheng
    Wu, Cheng-Hsien
    Yang, Chih-Cheng
    Chen, Wen-Chung
    Lin, Jiun-Chiu
    Wang, Ming-Hui
    Zheng, Hao-Xuan
    Chen, Min-Chen
    Sze, Simon M.
    APPLIED SURFACE SCIENCE, 2017, 414 : 224 - 229
  • [2] Laser damage characteristics of indium-tin-oxide film and polyimide film
    Liu, Xiaofeng
    Peng, Liping
    Gao, Yanqi
    Zhao, Yuan'an
    Liu, Yonggang
    Li, Dawei
    Zhu, Meiping
    Cao, Zhaoliang
    Shao, Jianda
    Wang, Xi
    INFRARED PHYSICS & TECHNOLOGY, 2019, 99 : 80 - 85
  • [3] On an indium-tin-oxide thin film based ammonia gas sensor
    Lin, Cheng-Wei
    Chen, Huey-Ing
    Chen, Tai-You
    Huang, Chien-Chang
    Hsu, Chi-Shiang
    Liu, Rong-Chau
    Liu, Wen-Chau
    SENSORS AND ACTUATORS B-CHEMICAL, 2011, 160 (01) : 1481 - 1484
  • [4] Characterization of indium-tin-oxide thin film microelectrodes for biomedical use
    Jakubec, A
    Tvarozek, V
    Novotny, I
    Rehacek, V
    Breternitz, V
    Knedlik, C
    Spiess, L
    MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK, 2003, 34 (07) : 662 - 665
  • [5] Effect of Indium-Tin-Oxide Schottky Contact on the Resistance Switching of NiO Film
    No, Young Soo
    Park, Dong-Hee
    Lee, Jeon-Kook
    Lee, Youn-Seoung
    Kim, Tae Whan
    Choi, Won-Kook
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (05)
  • [6] High-Voltage Indium-Tin-Oxide Thin-Film Transistors Possessing Drift Region Capped With Indium-Tin-Oxide Layer
    Wu, Wangran
    Huang, Tingrui
    Yang, Guangan
    Cao, Jie
    Yu, Zuoxu
    Sun, Huabin
    Xu, Yong
    Sun, Weifeng
    IEEE ELECTRON DEVICE LETTERS, 2024, 45 (07) : 1201 - 1204
  • [7] Influence of indium-tin-oxide thin-film quality on reverse leakage current of indium-tin-oxide/n-GaN Schottky contacts
    Wang, R. X.
    Xu, S. J.
    Djurisic, A. B.
    Beling, C. D.
    Cheung, C. K.
    Cheung, C. H.
    Fung, S.
    Zhao, D. G.
    Yang, H.
    Tao, X. M.
    APPLIED PHYSICS LETTERS, 2006, 89 (03)
  • [8] Fabrication of Indium-Tin-Oxide Thin-Film Transistor Using Anodization
    Xie, Lei
    Shao, Yang
    Xiao, Xiang
    Zhang, Letao
    Bi, Xiaobin
    Zhang, Shengdong
    2014 21ST INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES (AM-FPD), 2014, : 101 - 103
  • [9] A study of low temperature crystallization of amorphous thin film indium-tin-oxide
    Paine, DC
    Whitson, T
    Janiac, D
    Beresford, R
    Ow-Yang, CW
    Lewis, B
    JOURNAL OF APPLIED PHYSICS, 1999, 85 (12) : 8445 - 8450
  • [10] Current limiting mechanisms in indium-tin-oxide/poly3-hexylthlophene/aluminum thin film devices
    Dyakonov, V. (dyakonov@uni-oldenburg.de), 1600, American Institute of Physics Inc. (94):