The effect of deposition rate on the microstructure of YBCO thin films prepared by inverted cylindrical magnetron sputtering

被引:11
作者
Liu, XZ [1 ]
Li, YR [1 ]
Tao, BW [1 ]
Luo, A [1 ]
He, SM [1 ]
机构
[1] Univ Elect Sci & Technol China, Inst Informat Mat Sci & Engn, Chengdu 610054, Peoples R China
来源
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 2002年 / 371卷 / 02期
关键词
thin films; microstructure; superconductivity;
D O I
10.1016/S0921-4534(01)01077-2
中图分类号
O59 [应用物理学];
学科分类号
摘要
The dependence of YBCO thin film properties on the deposition rate was studied in this report. The thermodynamic growth parameters (substrate temperature, total pressure and oxygen partial pressure) were optimized at a fixed deposition rate first. Then keeping the thermodynamic growth parameters optimized values, YBCO thin films were deposited at different deposition rates. The effect of the deposition rate on the superconducting transition properties, c-axis lattice constant, concentration of lattice disorder and surface smoothness of YBCO thin films was studied. The measurements show that the optimized thermodynamic growth parameters are closely correlated to the deposition rate. At a fixed deposition rate of 0.5 Angstrom/s and its optimal thermodynamic growth parameters, YBCO thin films with superior superconducting transition temperature, the lowest concentration of lattice disorder, and the lowest surface roughness were prepared. By using the same thermodynamic growth parameters, changes in deposition rate were shown to degrade the superconducting transition temperature, increase the lattice disorder, and increase the roughness of the YBCO thin films. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:133 / 138
页数:6
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