Silicon grating coupler on a lithium niobate thin film waveguide

被引：33

作者：

Chen, Zhihua ^{[1
]}

Wang, Yiwen ^{[1
]}

Zhang, Honghu ^{[1
]}

Hu, Hui ^{[1
]}

机构：

[1] Shandong Univ, Sch Phys, State Key Lab Crystal Mat, Jinan 250100, Shandong, Peoples R China

来源：

OPTICAL MATERIALS EXPRESS | 2018年 / 8卷 / 05期

基金：

中国国家自然科学基金;

关键词：

Time domain analysis - Etching - Lithium - Ion beams - Niobium compounds - Thin films - Waveguides;

D O I：

10.1364/OME.8.001253

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A silicon (Si) grating coupler on a Si-strip-loaded lithium niobate (LN) thin film waveguide was proposed and realized. The optimized coupling efficiency (CE) by simulation was -5 dB at a wavelength of 1550 nm by the two-dimensional finite-different time-domain method (2D-FDTD), while the measured CE was about -18 dB. The coupler was etched by the focused ion beam etching method (FIB) in the Si strip thin film which was deposited by magnetron sputtering technology, patterned by photolithography and a lift-off process. The realization of the Si grating coupler and tapered waveguide could benefit the research of more advanced and complicated integrated optical devices. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

引用

页码：1253 / 1258

页数：6

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