Study of high-k Er2O3 thin layers as ISFET sensitive insulator surface for pH detection

被引:57
作者
Pan, Tung-Ming [1 ]
Lin, Jian-Chi [1 ]
Wu, Min-Hsien [2 ]
Lai, Chao-Sung [1 ]
机构
[1] Chang Gung Univ, Dept Elect Engn, Tao Yuan 333, Taiwan
[2] Chang Gung Univ, Grad Inst Biochem & Biomed Engn, Tao Yuan 333, Taiwan
关键词
EIS; Er2O3; Sensitivity; Drift rate; Hysteresis; Selectivity; OXIDE; HYSTERESIS; FILMS; TA2O5; DRIFT;
D O I
10.1016/j.snb.2009.01.051
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
This paper describes the structural and sensing properties of high-k Er2O3 sensing membranes deposited Oil Si Substrates through reactive sputtering. X-ray diffraction, X-ray photoelectron Spectroscopy, and atomic force microscopy were employed to analyze the Structural and morphological features of these films after annealing at various temperatures. Electrolyte-insulator-semiconductor (EIS) devices with a high-k Er2O3 sensing film annealed at 700 C exhibit good sensing characteristics, including a high sensitivity of 57.58 mV/pH in the solutions from pH I to pH 13, a small hysteresis voltage of 6.23 mV in the pH loop 7 -> 4 -> 7 -> 10 -> 7, a low drift rate of 1.75 mV/h in the pH 7 buffer solution. and a high selective responses towards H+. This improvement is attributed to the formation of a thinner silicate layer and the large surface roughness. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:619 / 624
页数:6
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