Atomic Layer Deposition of ZrO2 and HfO2 Nanotubes by Template Replication

被引：27

作者：

Gu, Diefeng ^{[1
,2
]}

Baumgart, Helmut ^{[1
,2
]}

Namkoong, Gon ^{[1
,2
]}

Abdel-Fattah, Tarek M. ^{[2
,3
]}

机构：

[1] Old Dominion Univ, Dept Elect Engn, Norfolk, VA 23529 USA

[2] Appl Res Ctr, Newport News, VA 23606 USA

[3] Christopher Newport Univ, Dept Biol Chem & Environm Sci, Newport News, VA 23606 USA

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 2009年 / 12卷 / 04期

关键词：

atomic layer deposition; hafnium compounds; nanotechnology; nanotubes; porosity; scanning electron microscopy; X-ray chemical analysis; zirconium compounds; FABRICATION; MEMBRANES; ARRAYS;

D O I：

10.1149/1.3070617

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Highly ordered zirconia and hafnia nanotubes were fabricated by atomic layer deposition (ALD) within the anodic alumina oxide (AAO) template. Scanning electron microscopy and energy-dispersive spectroscopy were used to characterize the morphology and elemental compositions of the different ALD coatings. The diameters of the AAO pores are in the range of 200-300 nm with a thickness of 60 mu m. The results indicated that the freestanding nanotubes were uniformly grown through the entire template thickness. The ALD process conformally replicated the AAO template dimensions. The number of ALD cycles controlled the resultant nanotube wall thickness.

引用

页码：K25 / K28

页数：4

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