Interfacial electronic states and self-formed p-n junctions in hydrogenated MoS2/SiC heterostructure

被引:43
作者
Fang, Qinglong [1 ]
Zhao, Xumei [2 ]
Huang, Yuhong [3 ]
Xu, Kewei [1 ,4 ]
Min, Tai [1 ]
Chu, Paul K. [5 ,6 ]
Ma, Fei [1 ,5 ,6 ]
机构
[1] Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Xian 710049, Shaanxi, Peoples R China
[2] Shaanxi Normal Univ, Coll Mat Sci & Engn, Xian 710062, Shaanxi, Peoples R China
[3] Shaanxi Normal Univ, Coll Phys & Informat Technol, Xian 710062, Shaanxi, Peoples R China
[4] Xian Univ Arts & Sci, Dept Phys & Optelect Engn, Xian 710065, Shaanxi, Peoples R China
[5] City Univ Hong Kong, Dept Phys, Tat Chee Ave, Kowloon, Hong Kong, Peoples R China
[6] City Univ Hong Kong, Dept Mat Sci & Engn, Tat Chee Ave, Kowloon, Hong Kong, Peoples R China
基金
中国国家自然科学基金;
关键词
INITIO MOLECULAR-DYNAMICS; INTEGRATED-CIRCUITS; BAND-GAP; TRANSITION; CONVERSION; NANOSHEETS; EVOLUTION; GRAPHENE; DIODES;
D O I
10.1039/c8tc00742j
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
It is difficult to generate p-n junctions in atomically thin transition metal dichalcogenides (TMDs) because of the great challenge of selective doping. First-principles calculations demonstrate that the electronic states in monolayer MoS2 could be substantially tuned through contact with hydrogenated SiC sheets, as a result of interface-induced electronic doping. Specifically, monolayer MoS2 exhibits metallic characteristics when put in contact with the Si termination of SiC-H (MoS2/SiC-H), but exhibits ambipolar type polarization when in contact with the C termination of CSi-H (MoS2/CSi-H). Furthermore, monolayer MoS2 can be switched from p-type on H-Si terminations (MoS2/H-SiC and MoS2/H-SiC-H) to n-type on H-C terminations (MoS2/H-CSi and MoS2/H-CSi-H). Accordingly, p-n junctions can be generated in bilayer MoS2 if a fully hydrogenated monolayer SiC is inserted between the layers. In addition, the staggered band alignment of the top and bottom monolayers of MoS2 leads to considerable rectification of current. The results are helpful for the design of TMD based nanoelectronic devices.
引用
收藏
页码:4523 / 4530
页数:8
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