Optimal actuator shape design with input and state constraints for a wafer heating application

被引:0
|
作者
Veldman, D. W. M. [1 ]
Fey, R. H. B. [1 ]
Zwart, H. J. [1 ,2 ]
van de Wal, M. M. J. [3 ]
van den Boom, J. D. B. J. [3 ]
Nijmeijer, H. [1 ]
机构
[1] Eindhoven Univ Technol, Dept Mech Engn, POB 513, NL-5600 MB Eindhoven, Netherlands
[2] Univ Twente, Dept Appl Math, Fac Elect Engn Math & Comp Sci, POB 217, NL-7500 AE Enschede, Netherlands
[3] ASML, De Run 6501, NL-5504 DR Veldhoven, Netherlands
来源
2019 AMERICAN CONTROL CONFERENCE (ACC) | 2019年
关键词
PARAMETER SYSTEMS;
D O I
暂无
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Thermal actuation can reduce deterioration of the imaging quality due to wafer heating. Because the placement of thermal actuators is critical for the performance of the resulting control system, a method to aid the design of an actuator layout is developed. Optimal actuator shapes are computed as the solution of an optimization problem that involves input and state constraints. The resulting actuator shapes have a clear physical interpretation for the next-generation wafer scanners and numerical results seem to indicate that the designed actuator shapes might be unique.
引用
收藏
页码:3789 / 3794
页数:6
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