Microstructure and composition of MgF2 optical coatings grown on Si substrate by PVD and IBS processes

被引：37
作者：
Jacob, D
Peiró, F
Quesnel, E
Ristau, D
机构：
[1] Univ Barcelona, Dept Elect, EME, E-08028 Barcelona, Spain
[2] CEA, LETI, F-38054 Grenoble 9, France
[3] Laser Zentrum Hannover, D-30419 Hannover, Germany
来源：
THIN SOLID FILMS | 2000年 / 360卷 / 1-2期
关键词：
fluorides; sputtering; physical vapour deposition; transmission electron microscopy;
D O I：
10.1016/S0040-6090(99)00738-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
MgF2 is a current material for the optical applications in the UV and deep UV range. Nevertheless, modern applications still require improvement of the optical and structural quality of the deposited layers. In the present work, the composition and microstructure of MgF2 single layers grown on Si [100] substrate by physical vapour deposition (PVD) and ion beam sputtering (IBS) processes, were analyzed and compared. Experiments were carried out using X-ray photoelectron spectroscopy (XPS) in depth profile, grazing angle X-ray diffraction (XRD) and transmission electron microscopy (TEM). Both layers exhibited a good stoichiometry and a low level of contamination. The sample grown by IBS revealed more homogeneous and regular columnar microstructure than the other one. (C) 2000 Elsevier Science S.A. All rights reserved.
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页码：133 / 138
页数：6
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