Fabrication of antireflection structures on TCO film for reflective liquid crystal display

被引：22

作者：

Chou, Ta-Hsin ^{[1
]}

Cheng, Kuei-Yuan ^{[1
]}

Chang, Tien-Li ^{[1
]}

Ting, Chia-Jen ^{[1
]}

Hsu, Hsiu-Chen ^{[1
]}

Wu, Chin-Jyi ^{[1
]}

Tsai, Jen-Hui ^{[1
]}

Huang, Tzn-Yu ^{[2
]}

机构：

[1] Ind Technol Res Inst, Mech & Syst Res Labs, Hsinchu 31040, Taiwan

[2] Natl Tsing Hua Univ, Dept Power Mech Engn, Hsinchu 30013, Taiwan

来源：

MICROELECTRONIC ENGINEERING | 2009年 / 86卷 / 4-6期

关键词：

Antireflection; Nanoimprint; Transparent conduction oxides film;

D O I：

10.1016/j.mee.2009.01.067

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The cholesteric liquid crystals display (ChLCD) is one kind of reflective liquid crystal display, the antireflective layer on its transparent conduction oxides (TCO) film is needed for good contrast and color performance. In this study, the finite difference time domain (FDTD) simulation and nanoimprinting fabrication of AR structures on the TCO film are developed. Finally, the reflectance of AR structures on TCO film is just half of the original film, and this result is useful for the reflective ChLCD product commercialized in the future. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.

引用

页码：628 / 631

页数：4

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