Polymers with base-amplifying side chains. Synthesis and properties

被引：8
|
作者：
Ichimura, K
Igarashi, A
Arimitsu, K
Seki, T
机构：
[1] Toho Univ, Fac Sci, Chiba 2748510, Japan
[2] Nagoya Univ, Grad Sch Engn, Dept Appl Chem, Chikusa Ku, Nagoya, Aichi 4640814, Japan
[3] Tokyo Univ Sci, Fac Sci & Technol, Dept Pure & Appl Chem, Noda, Chiba 2788510, Japan
[4] Dainippon Ink & Chem Inc, Gunma Factory, Tokyo, Gunma 3700723, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2004年 / 17卷 / 03期
关键词：
base proliferation; 9-fluorenylmethyl carbamate; photobase generator; positive-type resist;
D O I：
10.2494/photopolymer.17.433
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
[No abstract available]
引用
收藏
页码：433 / 434
页数：2
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