28 nm FD-SOI SRAM Design Using Read Stable Bit Cell Architecture

被引:0
|
作者
Deepak, A. Lourts [1 ]
Gandotra, Mrinal [2 ]
Yadav, Shailja [3 ]
Gandhi, Himani [4 ]
Umadevi, S. [2 ]
机构
[1] STMicroelectron Pvt Ltd, Greater Noida, India
[2] VIT Univ, Sch Elect Engn, Chennai, Tamil Nadu, India
[3] Banasthali Univ, Jaipur, Rajasthan, India
[4] Manipal Univ, Jaipur, Rajasthan, India
来源
NANOELECTRONIC MATERIALS AND DEVICES, VOL III | 2018年 / 466卷
关键词
SRAM; 6T; 5T; Dual port; Read stable;
D O I
10.1007/978-981-10-7191-1_18
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Background: Memories occupy the majority of chip area, and the response time for any system depends on its memory too. So, SRAMs are critical to the speed of processor operations and thus need to be rigorously optimized. The optimizations have to be in such a way that the constraints of better performance as well as reliability are met. Methods/Statistical analysis: The proposed bit cell is compared with conventional 6T bit cell for access time, read stability, on-current, and off-current, and the suitable sense amplifiers and decoder are analyzed. Findings: The proposed architecture for SRAM design meets the criteria of faster access time and read stability as compared to the conventional 6T SRAM. Write 1 operation achieves a rise of 16%, while write 0 and read 1 are better than 6T by 70 and 90%, respectively. The design was implemented on 28 nm FD-SOI platform. Application/Improvements: The proposed design has the better read stability as compared to the conventional 6T SRAM bit cell design.
引用
收藏
页码:193 / 206
页数:14
相关论文
共 50 条
  • [41] Compact 6T SRAM cell with robust Read/Write stabilizing design in 45nm Monolithic 3D IC technology
    Thomas, O.
    Vinet, M.
    Rozeau, O.
    Batude, P.
    Valentian, A.
    2009 IEEE INTERNATIONAL CONFERENCE ON INTEGRATED CIRCUIT DESIGN AND TECHNOLOGY, PROCEEDINGS, 2009, : 195 - 198
  • [42] A 5.92-Mb/mm2 28-nm Pseudo 2-Read/Write Dual-port SRAM using Double Pumping Circuitry
    Ishii, Yuichiro
    Yabuuchi, Makoto
    Sawada, Yohei
    Morimoto, Masao
    Tsukamoto, Yasumasa
    Yoshida, Yuta
    Shibata, Ken
    Sano, Toshiaki
    Tanaka, Shinji
    Nii, Koji
    2016 IEEE ASIAN SOLID-STATE CIRCUITS CONFERENCE (A-SSCC), 2016, : 17 - 20
  • [43] A 7T high stable and low power SRAM cell design using QG-SNS FinFET
    Ruhil, Shaifali
    Khanna, Vandana
    Dutta, Umesh
    Shukla, Neeraj Kumar
    AEU-INTERNATIONAL JOURNAL OF ELECTRONICS AND COMMUNICATIONS, 2023, 168
  • [44] Features of TCAD and SPICE Simulation of a Charged Particle Impact into a 6T SRAM Cell Manufactured Using the CMOS 28-nm Technology Node
    Petrosyants, K.O.
    Silkin, D.S.
    Popov, D.A.
    Ismail-Zade, M.R.
    Kharitonov, I.A.
    Pereverzev, L.E.
    Morozov, A.A.
    Turgenev, P.V.
    Russian Microelectronics, 2024, 53 (07) : 737 - 743
  • [45] A 1MHz 256kb Ultra Low Power Memory Macro for Biomedical Recording Applications in 22nm FD-SOI Using FECC to Enable Data Retention Down to 170mV Supply Voltage
    Vanhoof, Bob
    Dehaene, Wim
    IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERS, 2024, 71 (01) : 299 - 305
  • [46] Novel 10-T Write Driver SRAM Design Using 45 nm CMOS Technology with Leakage Current Reduction Scheme for FPGA Routing Switch Architecture
    Narayanan, S. Lakshmi
    Korah, Reeba
    Swarnalatha, A.
    JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, 2018, 13 (05) : 775 - 787
  • [47] A 9T high-stable and Low-Energy Half-Select-Free SRAM Cell Design using TMDFETs
    Abbasian, Erfan
    Birla, Shilpi
    Gholipour, Morteza
    ANALOG INTEGRATED CIRCUITS AND SIGNAL PROCESSING, 2022, 112 (01) : 141 - 149
  • [48] A 9T high-stable and Low-Energy Half-Select-Free SRAM Cell Design using TMDFETs
    Erfan Abbasian
    Shilpi Birla
    Morteza Gholipour
    Analog Integrated Circuits and Signal Processing, 2022, 112 : 141 - 149
  • [49] A comprehensive analysis of different 7T SRAM topologies to design a 1R1 W bit interleaving enabled and half select free cell for 32 nm technology node
    Rawat, Bhawna
    Mittal, Poornima
    PROCEEDINGS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 2022, 478 (2259):
  • [50] Characterization of a novel radiation hardened by design (RHD14) bit-cell based on 20-nm FinFET technology using TCAD simulations
    Limachia, Mitesh J.
    Thakker, Rajesh
    Kothari, Nikhil
    MICROELECTRONICS RELIABILITY, 2023, 142