Influence of growing conditions on the reactivity of Ni supported graphene towards CO

被引：10

作者：

Celasco, E. ^{[1
,2
]}

Carraro, G. ^{[1
,2
]}

Smerieri, M. ^{[1
]}

Savio, L. ^{[1
]}

Rocca, M. ^{[1
,2
]}

Vattuone, L. ^{[1
,2
]}

机构：

[1] Univ Genoa, Dipartimento Fis, I-16146 Genoa, Italy

[2] IMEM CNR Unita Operat Genova, I-16146 Genoa, Italy

来源：

JOURNAL OF CHEMICAL PHYSICS | 2017年 / 146卷 / 10期

关键词：

CARBON-MONOXIDE; NI(111); COVALENT; FUNCTIONALIZATION; MECHANISMS; ADSORPTION; CHEMISTRY; FILMS; OXIDE; METAL;

D O I：

10.1063/1.4978234

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Free standing graphene is chemically inert but, as recently demonstrated, CO chemisorption occurs at lowcrystal temperature on the single layer grown by ethene dehydrogenation on Ni(111). Such layer is inhomogeneous since different phases coexist, the relative abundance of which depends on the growth conditions. Here we show by X ray photoemission and high resolution electron energy loss spectroscopies that the attained CO coverage depends strongly on the relative weight of the different phases as well as on the concentration of carbon in the Ni subsurface region. Our data show that the chemical reactivity is hampered by the carbon content in the substrate. The correlation between the amount of adsorbed CO and the weight of the different graphene phases indicates that the top-fcc configuration is the most reactive. Published by AIP Publishing.

引用

页数：7

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