Simulation study of sputtering process.

被引：0

作者：

Sharma, KR ^{[1
]}

机构：

[1] Deemed Univ, Vellore Inst Technol, Vellore 632014, Tamil Nadu, India

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2002年 / 223卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

120-COMP

引用

页码：U481 / U481

页数：1

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