Real-time microlithography employing a transparent liquid crystal display (LCD) panel as a configurable mask

被引：0
|
作者：
Pieh, SH [1 ]
Park, BH [1 ]
Jang, YJ [1 ]
Kim, KH [1 ]
Kim, GT [1 ]
机构：
[1] Korea Univ, Dept Elect Engn, Seoul 136701, South Korea
来源：
OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3 | 2004年 / 5377卷
关键词：
configurable mask; LCD (liquid crystal display) panel; exposure system; selective exposure; real-time lithography; microlithography; in situ photolithography; stereo-typed microscope; imaging system;
D O I：
10.1117/12.534501
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We describe a simple concept of an in situ photolithographic technique by using a liquid crystal display panel as a configurable mask and a CCD (charge coupled device) camera as a simple imaging system. The successive operation of imaging and configurable masking enabled a real-time projection lithography process by the selective exposure of light through the LCD (liquid crystal display) panel. A correction of a defect pattern could be also demonstrated by optimizing the exposure conditions and aligning the mismatches between imaging and the corresponding lithographic patterning.
引用
收藏
页码：1040 / 1046
页数：7
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