An In Situ Synchrotron Study of Zinc Anode Planarization by a Bismuth Additive

被引:49
作者
Gallaway, Joshua W. [1 ]
Gaikwad, Abhinav M. [1 ]
Hertzberg, Benjamin [2 ,3 ]
Erdonmez, Can K. [4 ]
Chen-Wiegart, Yu-Chen Karen [5 ]
Sviridov, Lev A. [1 ]
Evans-Lutterodt, Kenneth [5 ]
Wang, Jun [5 ]
Banerjee, Sanjoy [1 ]
Steingart, Daniel A. [2 ,3 ]
机构
[1] CUNY Energy Inst, City Coll New York, Dept Chem Engn, New York, NY 10031 USA
[2] Princeton Univ, Dept Mech & Aerosp Engn, Princeton, NJ 08544 USA
[3] Princeton Univ, Andlinger Ctr Energy & Environm, Princeton, NJ 08544 USA
[4] Brookhaven Natl Lab, Energy Storage Grp, Upton, NY 11973 USA
[5] Brookhaven Natl Lab, Photon Sci Directorate, Upton, NY 11973 USA
关键词
METAL-OXIDE ADDITIVES; CAVITY MICROELECTRODE; ALKALINE ELECTROLYTES; MATHEMATICAL-MODEL; KINETIC-ANALYSIS; DEPOSITION; BEHAVIOR; FLOW; CU; ELECTROCHEMISTRY;
D O I
10.1149/2.037403jes
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Cyclic voltammetry of zinc plated from flowing alkaline zincate electrolyte with a bismuth additive showed a marked mass transport effect during metal layer deplating. This bismuth was added as Bi2O3 and had a saturated concentration of 26 ppm bismuth. Using a small, transparent window flow cell the mechanism was studied in situ using synchrotron X-rays. X-ray microdiffraction revealed that the metal-electrolyte interface was bismuth rich, and bismuth behaved in a manner similar to a surfactant. Transmission X-ray microscopy revealed that in the presence of bismuth additive, 5 pm raised features on the metal layer were preferentially dissolved during deplating. However, macro-morphology experiments demonstrated that at 26 ppm a detrimental bismuth buildup occurred over many cycles. By reducing additive concentration to 3 ppm a metal layer was planarized compared to a no-additive control, while avoiding the bismuth buildup. These findings suggested that 3 ppm bismuth could be used to planarize zinc metal layers such as those in flow-assisted zinc batteries. However, concentration will need to be well-controlled. (C) 2013 The Electrochemical Society. All rights reserved.
引用
收藏
页码:A275 / A284
页数:10
相关论文
共 44 条
[1]   Small-gap insertion-device development at the National Synchrotron Light Source - performance of the new X13 mini-gap undulator [J].
Ablett, JM ;
Berman, LE ;
Kao, CC ;
Rakowsky, G ;
Lynch, D .
JOURNAL OF SYNCHROTRON RADIATION, 2004, 11 :129-131
[2]   THE BEHAVIOR OF ZINC ELECTRODE IN ALKALINE ELECTROLYTES .2. A KINETIC-ANALYSIS OF ANODIC-DISSOLUTION [J].
CACHET, C ;
SAIDANI, B ;
WIART, R .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (03) :644-654
[3]   THE BEHAVIOR OF ZINC ELECTRODE IN ALKALINE ELECTROLYTES .1. A KINETIC-ANALYSIS OF CATHODIC DEPOSITION [J].
CACHET, C ;
SAIDANI, B ;
WIART, R .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (03) :678-687
[4]  
Cachet-Vivier C., 2001, ELECTROCHIM ACTA, V46, P907
[5]   EFFECTS OF ELECTROCHEMICALLY INCORPORATED BISMUTH ON THE DISCHARGE AND RECHARGE OF ELECTRODEPOSITED MANGANESE-DIOXIDE FILMS IN 9M AQUEOUS KOH [J].
CASTLEDINE, CG ;
CONWAY, BE .
JOURNAL OF APPLIED ELECTROCHEMISTRY, 1995, 25 (08) :707-715
[6]  
CHIN DT, 1982, J ELECTROCHEM SOC, V129, P2677, DOI 10.1149/1.2123647
[7]   SUBSTRATE EFFECTS ON ZINC DEPOSITION FROM ZINCATE SOLUTIONS .1. DEPOSITION ON CU, AU, CD AND ZN [J].
CHU, MG ;
MCBREEN, J ;
ADZIC, G .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (11) :2281-2286
[8]   KINETICS AND MECHANISM OF DEPOSITION OF ZINC FROM ZINCATE IN CONCENTRATED ALKALI HYDROXIDE SOLUTIONS [J].
DESPIC, AR ;
JOVANOVIC, D ;
RAKIC, T .
ELECTROCHIMICA ACTA, 1976, 21 (01) :63-77
[9]   BEHAVIOR OF THE ZINC ELECTRODE IN ALKALINE-SOLUTIONS .3. EQUILIBRIUM POTENTIAL [J].
DIRKSE, TP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (09) :1456-1459
[10]   A Lateral Microfluidic Cell for Imaging Electrodeposited Zinc near the Shorting Condition [J].
Gallaway, Joshua W. ;
Desai, Divyaraj ;
Gaikwad, Abhinav ;
Corredor, Charlie ;
Banerjee, Sanjoy ;
Steingart, Dan .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2010, 157 (12) :A1279-A1286