Efficiency improvements in AlGaN-based deep ultraviolet light-emitting diodes using inverted-V-shaped graded Al composition electron blocking layer

被引:52
作者
Fan, Xuancong [1 ]
Sun, Huiqing [1 ]
Li, Xuna [1 ]
Sun, Hao [1 ]
Zhang, Cheng [1 ]
Zhang, Zhuding [1 ]
Guo, Zhiyou [1 ]
机构
[1] S China Normal Univ, Inst Optoelect Mat & Technol, Lab Nanophoton Funct Mat & Devices, Guangzhou 510631, Guangdong, Peoples R China
关键词
Electron blocking layer; Deep ultraviolet light-emitting diodes; AlGaN; BAND PARAMETERS; PERFORMANCE; HETEROSTRUCTURES; SEMICONDUCTORS; LEDS;
D O I
10.1016/j.spmi.2015.10.003
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
This paper principally presents the numerical investigation of electron blocking layers (EBL) structures with different Al concentration gradient changing in AlGaN-based deep ultraviolet light emitting diodes (DUV-LEDs). Compared to conventional EBL structure with constant Al composition, the LED with inverted-V-shaped EBL structure has higher output power and carriers recombination rate, but the efficiency droop will decrease obviously while the electron leakage current can reduce much as well. Therefore, the result indicates that appropriate Al component in LED can enhance electron and hole recombination rate in the active region. The improved performance is mainly attribute the sufficient electron-barrier height and relatively higher hole injection efficiency which results from the mitigated band-bending. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:467 / 473
页数:7
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