X-ray and neutron porosimetry as powerful methodologies for determining structural characteristics of porous Low-k thin films

被引：5

作者：

Lee, HJ ^{[1
]}

Vogt, BD ^{[1
]}

Soles, CL ^{[1
]}

Liu, DW ^{[1
]}

Bauer, BJ ^{[1
]}

Wu, WL ^{[1
]}

Lin, EK ^{[1
]}

Kang, GG ^{[1
]}

Ko, MJ ^{[1
]}

机构：

[1] NIST, Div Polymers, Gaithersburg, MD 20899 USA

来源：

PROCEEDINGS OF THE IEEE 2004 INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE | 2004年

关键词：

D O I：

10.1109/IITC.2004.1345718

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

Methylsilsesquioxane based porous low-k dielectric films with varying porogen loading have been characterized using X-ray and neutron porosimetry to determine their pore size distribution, average density, wall density, porosity, density profiles, and porosity profiles. The porosity and the average pore size of the sample with 45 % porogen were 52 % and 23 Angstrom in radius, respectively. Pore size was consistent with that from small angle neutron scattering measurements. The wall density was found to be independent of the porogen content and it appeared that the porogen was 100 % effective in generating pores.

引用

页码：136 / 138

页数：3

共 6 条

[1] ANALYTICAL SCATTERING FUNCTION OF A POLYDISPERSE PERCUS-YEVICK FLUID WITH SCHULZ-(GAMMA-) DISTRIBUTED DIAMETERS [J].