Effect of surface roughness on multilayer film growth

被引：6

作者：

Modi, M. H. ^{[1
,2
]}

Rai, S. K. ^{[2
]}

Thomasset, M. ^{[1
]}

Lodha, G. S. ^{[2
]}

Idir, M. ^{[1
]}

机构：

[1] Synchrotron SOLEIL, F-91192 Gif Sur Yvette, France

[2] Raja Ramanna Ctr Adv Technol, Indore 452013, India

来源：

EUROPEAN PHYSICAL JOURNAL-SPECIAL TOPICS | 2009年 / 167卷

关键词：

REFLECTION; DENSITY; PROFILE;

D O I：

10.1140/epjst/e2009-00932-9

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

NbC/Si multilayers grown on silicon substrates of different roughness have been used to study the influence of surface quality on growth characteristics. Surface morphology of substrate and multilayer film are characterized by topographic measurements using atomic force microscopy (AFM) technique and power spectral density analysis (PSD). Grazing incidence x-ray reflectivity (GIXR) technique in combination with PSD analysis reveals a growth characteristic of multilayer film on substrates of different roughness. It is revealed that the stochastic growth of NbC on rough substrate leads to formation of clusters of varying size depending on initial substrate roughness. Details of growth characteristic are discussed.

引用

页码：27 / 32

页数：6

共 11 条

[1] Determination of density profile of ultrathin SiO2/Si3N4/SiO2/Si(001) multilayer structures using x-ray reflectivity technique [J].

Banerjee, S ;

Ferrari, S ;

Piagge, R ;

Spandoni, S .

APPLIED PHYSICS LETTERS, 2004, 84 (19) :3798-3800

[2] CALCULATION OF THE POWER SPECTRAL DENSITY FROM SURFACE PROFILE DATA [J].

ELSON, JM ;

BENNETT, JM .

APPLIED OPTICS, 1995, 34 (01) :201-208

[3] Epitaxial growth of Ge and SiGe on Si substrates [J].

Larsen, Arne Nylandsted .

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2006, 9 (4-5) :454-459

[4]

Michette A. G., 1986, OPTICAL SYSTEMS SOFT

[5] Determination of layer structure in Mo/Si multilayers using soft X-ray reflectivity [J].

Modi, MH ;

Lodha, GS ;

Nayak, M ;

Sinha, AK ;

Nandedkar, RV .

PHYSICA B-CONDENSED MATTER, 2003, 325 (1-4) :272-280

[6] CHARACTERIZATION OF SURFACES BY GRAZING X-RAY REFLECTION - APPLICATION TO STUDY OF POLISHING OF SOME SILICATE-GLASSES [J].

NEVOT, L ;

CROCE, P .

REVUE DE PHYSIQUE APPLIQUEE, 1980, 15 (03) :761-779

[7] SURFACE STUDIES OF SOLIDS BY TOTAL REFLECTION OF X-RAYS [J].

PARRATT, LG .

PHYSICAL REVIEW, 1954, 95 (02) :359-369

[8] Kinetic-energy induced smoothening and delay of epitaxial breakdown in pulsed-laser deposition [J].

Shin, Byungha ;

Aziz, Michael J. .

PHYSICAL REVIEW B, 2007, 76 (08)

[9] MULTILAYER X-RAY MIRRORS - INTERFACIAL ROUGHNESS, SCATTERING, AND IMAGE QUALITY [J].

SPILLER, E ;

STEARNS, D ;

KRUMREY, M .

JOURNAL OF APPLIED PHYSICS, 1993, 74 (01) :107-118

[10]

Spiller E., 1994, Soft X-ray Optics

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