Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2 thin films

被引:21
作者
Belkind, A. [1 ]
Zhu, W.
Lopez, J.
Becker, K.
机构
[1] Stevens Inst Technol, Dept Phys & Engn Phys, Hoboken, NJ 07030 USA
[2] Stevens Inst Technol, Ctr Environm Syst, Hoboken, NJ 07030 USA
关键词
D O I
10.1088/0963-0252/15/2/S03
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Time-resolved optical emission spectroscopy is applied to analyse pulsed dc magnetron plasmas during sputter deposition of Ti and TiO2 thin films. The studies are focused on the temporal behaviour of emissions of selected atomic titanium, argon and oxygen during the 'on-time', when the magnetron plasma source is turned on, and during the 'reverse-time', when the magnetron plasma source is turned off. Single and double exponential decays of the optical emissions were found during the 'reverse-time'. During the 'on-time', we observed a rapid increase in some emissions with a more or less pronounced overshoot and a slow increase in other emissions which follow the temporal evolution of the conduction current. The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms ( metallic mode) and the O atoms (oxide mode).
引用
收藏
页码:S17 / S25
页数:9
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