Production of a large-diameter uniform plasma by modified magnetron-typed radio frequency discharge

被引:6
作者
Li, YL
Iizuka, S
Sato, N
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 7B期
关键词
modified magnetron typed RF plasma; large-diameter plasma; large-area plasma processing; uniform plasma;
D O I
10.1143/JJAP.36.4554
中图分类号
O59 [应用物理学];
学科分类号
摘要
The properties of a new plasma source, i.e. a large-scale modified-magnetron typed (MMT) radio frequency (RF) plasma source, are investigated for producing a uniform high-density plasma with a large diameter of the order of 1 m. A plasma with uniformity within a few percent is produced over 120 cm in diameter in front of the substrate under an argon pressure of 1 m Torr. The plasma density is 6 x 10(10) cm(-3) at the axial center of the RF electrode when the incident RF power is 2.8 kW. The plasma density is almost proportional to the RF power. Since the structure of MMT plasma source is quite simple, it is useful for large area plasma processing.
引用
收藏
页码:4554 / 4557
页数:4
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