Two-Cathode Filtered Vacuum-Arc Plasma Source

被引：9

作者：

Aksenov, Ivan I. ^{[1
]}

Aksyonov, Dmitriy S. ^{[1
]}

Vasilyev, V. V. ^{[1
]}

Luchaninov, A. A. ^{[1
]}

Reshetnyak, E. N. ^{[1
]}

Strel'nitskij, Volodimir E. ^{[1
]}

机构：

[1] Kharkov Phys & Technol Inst, Natl Sci Ctr, UA-61108 Kharkov, Ukraine

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2009年 / 37卷 / 08期

关键词：

Coatings; filters; ions; plasma arc devices; DEPOSITION;

D O I：

10.1109/TPS.2009.2018820

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The design and operation principle of the new two-cathode filtered vacuum-arc plasma source are discussed. The results of probe measurements of ion components of the output plasma stream depending on magnetic field magnitude and geometry in plasma-guiding channels of the source are presented. The system effectiveness ratio of the device makes up to similar to 2.5%. The possibility of control of the ion current density distribution diagram is shown. The nonuniformity of component concentration distribution of the coating at the use of the cathodes from aluminum and titanium is about +/- 6.5%.

引用

页码：1511 / 1516

页数：6

共 20 条

[1]

Aksenov I.I., 2005, The Vacuum Arc in Erosion Plasma Sources

[2]

Aksenov II, 2004, INT SYM DISCH ELECTR, V21, P467

[3] Efficiency of magnetic plasma filters [J].

Aksenov, II ;

Strel'nitskij, VE ;

Vasilyev, VV ;

Zaleskij, DY .

SURFACE & COATINGS TECHNOLOGY, 2003, 163 :118-127

[4] Transformation of axial vacuum-arc plasma flows into radial streams and their use in coating deposition [J].

Aksenov, II ;

Khoroshikh, VM ;

Lomino, NS ;

Ovcharenko, VD ;

Zadneprovskiy, YA .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1999, 27 (04) :1026-1029

[5]

AKSENOV II, 1980, PLASMA PHYS, V6, P918

[6]

AKSENOV II, 1996, P 17 ISDEIV BERK, V2, P895

[7]

AKSYONOV II, 1979, DEVICES TECHNIQUES E, P160

[8] Approaches to rid cathodic arc plasmas of macro- and nanoparticles: a review [J].

Anders, A .

SURFACE & COATINGS TECHNOLOGY, 1999, 120 :319-330

[9]

[Anonymous], 2008, US Patent, Patent No. [US 7,381,311, 7381311]

[10]

[Anonymous], 1997, Int. Appl, Patent No. [PCT/ IB98/ 01794, 99223396]

← 1 2 →