Bipolar I-MOS-An Impact-Ionization MOS With Reduced Operating Voltage Using the Open-Base BJT Configuration

被引:28
作者
Kumar, Mamidala Jagadesh [1 ]
Maheedhar, Maram [1 ]
Varma, P. Pradeep [1 ]
机构
[1] IIT Delhi, Dept Elect Engn, New Delhi 110016, India
关键词
Bipolar I-MOS; low operating voltage; p-i-n I-MOS; reliability; transistor gain action; IMPROVED RELIABILITY; BISTABLE RESISTOR; BIRISTOR; DEVICE; TRANSISTOR;
D O I
10.1109/TED.2015.2492358
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this brief, we propose a novel bipolar junction transistor-based I-MOS, called the bipolar I-MOS, to reduce the operating voltage of the I-MOS using the transistor gain action. Using 2-D simulations, we demonstrate that the proposed bipolar I-MOS exhibits a low operating voltage (similar to 2.8 V), which is similar to 60% lower than that of the corresponding p-i-n I-MOS, and also a steep subthreshold slope of 6.25 mV/decade. In the bipolar I-MOS, since the avalanche-generated carriers do not pass through the channel region under the gate, it is expected to have a higher reliability compared with the p-i-n I-MOS. Therefore, the bipolar I-MOS could be a promising candidate for near ideal switching applications.
引用
收藏
页码:4339 / 4342
页数:4
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