Quantitative voltage measurement of high-frequency internal integrated circuit signals by scanning probe microscopy

被引:4
作者
Weng, Z [1 ]
Falkingham, CJ [1 ]
Bridges, GE [1 ]
Thomson, DJ [1 ]
机构
[1] Univ Manitoba, Dept Elect & Comp Engn, Winnipeg, MB R3T 5V6, Canada
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2002年 / 20卷 / 03期
关键词
D O I
10.1116/1.1460901
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This article describes a scanning probe microscopy technique for quantitative high-speed voltage wave form measurement inside an operating integrated circuit. Internal signals are determined by sensing the local electrostatic force on a noncontacting micromachined probe cantilever that is closely positioned above the circuit test point. Amplitude modulation based downconversion is employed to measure repetitive high-frequency signals which can have a bandwidth much greater than the mechanical response of the probe. A force-nulling technique is used to obtain accurate absolute voltages without the need for complex calibration or precise probe positioning, and enables direct measurement of passivated circuits. A method of eliminating dc offset errors, such as that due to material work function differences, is described. Measurement of signals on the passivated interconnects of a wideband distributed amplifier is presented. The instrument demonstrates a voltage accuracy of <30 mV over a dynamic range of 2.5 V. (C) 2002 American Vacuum Society.
引用
收藏
页码:999 / 1003
页数:5
相关论文
共 13 条
[1]   Absolute quantitative time resolved voltage measurements on 1 mu m conducting lines of integrated circuits via electric force microscope-(EFM-) testing [J].
Bangert, J ;
Kubalek, E .
MICROELECTRONICS AND RELIABILITY, 1997, 37 (10-11) :1579-1582
[2]   VOLTAGE CONTRAST IN INTEGRATED-CIRCUITS WITH 100 NM SPATIAL-RESOLUTION BY SCANNING FORCE MICROSCOPY [J].
BOHM, C ;
SAURENBACH, F ;
TASCHNER, P ;
ROTHS, C ;
KUBALEK, E .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1993, 26 (10) :1801-1805
[3]   HIGH-FREQUENCY PATTERN EXTRACTION IN DIGITAL INTEGRATED-CIRCUITS USING SCANNING ELECTROSTATIC FORCE MICROSCOPY [J].
BRIDGES, GE ;
SAID, RA ;
MITTAL, M ;
THOMSON, DJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (03) :1375-1379
[4]   HETERODYNE ELECTROSTATIC FORCE MICROSCOPY FOR NONCONTACT HIGH-FREQUENCY INTEGRATED-CIRCUIT MEASUREMENT [J].
BRIDGES, GE ;
SAID, RA ;
THOMPSON, DJ .
ELECTRONICS LETTERS, 1993, 29 (16) :1448-1449
[5]   Scanning probe microscopy for testing ultrafast electronic devices [J].
Hou, AS ;
Nechay, BA ;
Ho, F ;
Bloom, DM .
OPTICAL AND QUANTUM ELECTRONICS, 1996, 28 (07) :819-841
[6]   PICOSECOND ELECTRICAL SAMPLING USING A SCANNING FORCE MICROSCOPE [J].
HOU, AS ;
HO, F ;
BLOOM, DM .
ELECTRONICS LETTERS, 1992, 28 (25) :2302-2303
[7]   Dynamic internal testing of CMOS circuits using hot luminescence [J].
Kash, JA ;
Tsang, JC .
IEEE ELECTRON DEVICE LETTERS, 1997, 18 (07) :330-332
[8]   Optical probing of flip chip packaged microprocessors [J].
Paniccia, M ;
Rao, RM ;
Yee, WM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3625-3630
[9]   SAMPLING AND REAL-TIME METHODS IN ELECTROOPTIC PROBING SYSTEM [J].
TAKAHASHI, H ;
AOSHIMA, SI ;
TSUCHIYA, Y .
IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 1995, 44 (05) :965-971
[10]  
Thong T., 2016, COLONISATION PROSELY