Microfocus-infrared synchrotron ellipsometer for mapping of ultra thin films

被引:7
作者
Gensch, M.
Korte, E. H.
Esser, N.
Schade, U.
Hinrichs, K.
机构
[1] Inst Analyt Sci, ISAS, Dept Berlin, D-12489 Berlin, Germany
[2] Inst Analyt Sci, ISAS, D-44139 Dortmund, Germany
[3] Berliner Elektronenspeicherring Gesell Synchrotro, D-12589 Berlin, Germany
关键词
organic thin films; infrared; ellipsometry; synchrotron radiation; silicon; anisotropy; polymer; mapping;
D O I
10.1016/j.infrared.2006.01.007
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A purpose-build infrared spectroscopic ellipsometer is presented that enables to investigate sample areas of less than 1 mm(2) with monolayer sensitivity. This sensitivity is achieved for films on metallic as well as on semiconducting substrates. Measurement principle and performance of the instrument are discussed on selected examples and an outline of the currently performed upgrading of the set-up is given. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:74 / 77
页数:4
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