共 10 条
[1]
*IEEE, 802151 IEEE
[3]
KOSKENVUORI M, 2002, P EUR PRAG CZECH REP, V16, P383
[6]
Characterization of DI water/O3 oxidation of Si (100) and Si (111) surfaces by OCP measurements
[J].
ULTRA CLEAN PROCESSING OF SILICON SURFACES 2000,
2001, 76-77
:161-164
[7]
Razavi Behzad., 1998, RF MICROELECTRONICS, P214
[8]
SALT D, 1987, HDB QUARTZ CRYSTAL D
[9]
VIG JR, 1999, ULTRASONIC INSTRUMEN, pCH7